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1992•Physics and Chemistry of Materials TreatmentRequires access

Structure and properties of SiO 2 and Ta 2 O 5 films deposited by ion-plasma sputtering

P. I. Ignatenko, Alexander Goncharov, Yu. V. Kudelin

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Key concepts: Sputtering, Ion, Materials science, Plasma, Chemistry, Thin film, Nanotechnology, Physics

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