2017•Unpublished venueRequires access

Structural and electrical characteristics of TiO 2 film deposited by plasma enhanced atomic layer deposition and RF sputtering

Prashant Singh, Rajesh Kumar Jha, Rajat Kumar Singh, B. R. Singh

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Key concepts: Atomic layer deposition, Sputtering, Layer (electronics), Deposition (geology), Materials science, Plasma, Thin film, Sputter deposition

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Structural and electrical characteristics of TiO 2 film deposited by plasma enhanced atomic layer deposition and RF sputtering — Research Paper | ScholarLens