2000•Plasmas and PolymersRequires access

Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) Conditions

Krzysztof Schmidt‐Szałowski, Zenobia Rżanek-Boroch, Jan Sentek, Zygmund Rymuza, Zbigniew Kusznierewicz, Maciej Misiak

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Key concepts: Organosilicon, Hexamethyldisiloxane, Silicon, Reagent, Chemistry, Nitrogen, Silicon oxide, Thin film

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Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) Conditions — Research Paper | ScholarLens