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2003•Thin Solid FilmsRequires access

Argon–oxygen plasma treatment of deposited organosilicon thin films

Maikel F. A. M. van Hest, A. Klaver, D.C. Schram, M. C. M. van de Sanden

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Key concepts: Hexamethyldisiloxane, Organosilicon, Oxygen, Argon, Thin film, Silicon, Plasma, Carbon film

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