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RESEARCH OF STRUCTURAL PROPERTIES OF RE-DOPED ZnO THIN FILMS GROWN BY RF MAGNETRON SPUTTERING

Feng Pan

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Abstract

The ZnO thin film and rare earth(RE=La,Nd) doped ZnO thin films were deposited on Si(111) substrate by RF magnetron sputtering and annealed at 400℃ under air.As analyzed by XRD,ZnO thin films with high c-axis orientation growth was realized,RE-doped ZnO thin films were nano-multi-crystal thin films with free growth.The rough surface morphology of RE-doped ZnO thin films were observed by AFM.

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What this paper is about

The ZnO thin film and rare earth(RE=La,Nd) doped ZnO thin films were deposited on Si(111) substrate by RF magnetron sputtering and annealed at 400℃ under air.As analyzed by XRD,ZnO thin films with high c-axis orientation growth was realized,RE-doped ZnO thin films were nano-multi-crystal thin films with free growth.The rough surface morphology of RE-doped ZnO thin films were observed by AFM.

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Available abstract

The ZnO thin film and rare earth(RE=La,Nd) doped ZnO thin films were deposited on Si(111) substrate by RF magnetron sputtering and annealed at 400℃ under air.As analyzed by XRD,ZnO thin films with high c-axis orientation growth was realized,RE-doped ZnO thin films were nano-multi-crystal thin films with free growth.The rough surface morphology of RE-doped ZnO thin films were observed by AFM.

Key concepts: Thin film, Materials science, Doping, Sputter deposition, Substrate (aquarium), Sputtering, Cavity magnetron, Optoelectronics

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RESEARCH OF STRUCTURAL PROPERTIES OF RE-DOPED ZnO THIN FILMS GROWN BY RF MAGNETRON SPUTTERING — Research Paper | ScholarLens