Tan Zhi
Abstract
The ultraviolet photolithography process of thick photoresists, AZ4620 and SU 8, was studied and optimized. The microstructures with high aspect ratio and vertical sidewalls can be patterned by SU 8 photoresist. The applications of thick resist photolithography in MEMS fabrication process are also presented in this paper.
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The ultraviolet photolithography process of thick photoresists, AZ4620 and SU 8, was studied and optimized. The microstructures with high aspect ratio and vertical sidewalls can be patterned by SU 8 photoresist. The applications of thick resist photolithography in MEMS fabrication process are also presented in this paper.
Key concepts: Photoresist, Photolithography, Resist, Lithography, Fabrication, Materials science, Microelectromechanical systems, Computational lithography