2018•Micro/Nano technologiesRequires access

Modeling and Simulation of SU-8 Thick Photoresist Lithography

Zai‐Fa Zhou, Qing‐An Huang

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Key concepts: Resist, Photoresist, Lithography, Materials science, X-ray lithography, Photolithography, Microelectromechanical systems, Etching (microfabrication)

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Modeling and Simulation of SU-8 Thick Photoresist Lithography — Research Paper | ScholarLens