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Research on electrochemical polishing technics of high pure aluminum film

Hong Bi

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Abstract

A kind of electrochemical polishing technics for high pure aluminum is studied in the polishing system of the HClO_4/C_2H_5OH under voltage of 15 V. The variation of current density and the appearence of dark film during polishing process are investigated. The influence of distance between electrodes and polishing temperature on polishing quality is also discussed in this paper. The optimum technical parameters are obtained as follows: distance between electrodes of 0.7~0.8 cm, polishing temperature of 10~15 ℃, current density of 0.7~0.8 A/m~2 and polishing time of 3 min.

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What this paper is about

A kind of electrochemical polishing technics for high pure aluminum is studied in the polishing system of the HClO_4/C_2H_5OH under voltage of 15 V. The variation of current density and the appearence of dark film during polishing process are investigated. The influence of distance between electrodes and polishing temperature on polishing quality is also discussed in this paper. The optimum technical parameters are obtained as follows: distance between electrodes of 0.7~0.8 cm, polishing temperature of 10~15 ℃, current density of 0.7~0.8 A/m~2 and polishing time of 3 min.

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Available abstract

A kind of electrochemical polishing technics for high pure aluminum is studied in the polishing system of the HClO_4/C_2H_5OH under voltage of 15 V. The variation of current density and the appearence of dark film during polishing process are investigated. The influence of distance between electrodes and polishing temperature on polishing quality is also discussed in this paper. The optimum technical parameters are obtained as follows: distance between electrodes of 0.7~0.8 cm, polishing temperature of 10~15 ℃, current density of 0.7~0.8 A/m~2 and polishing time of 3 min.

Key concepts: Polishing, Electrode, Current density, Aluminium, Materials science, Electrochemistry, Metallurgy, Chemistry

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