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1995•MRS ProceedingsRequires access

Investigations Of The Chemical-Mechanical Polishing Of Polymer Films For ILD Applications

Jan M. Neirynck, Shyam P. Murarka, Ronald J. Gutmann

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Key concepts: Chemical-mechanical planarization, Materials science, Dielectric, Slurry, Interconnection, Copper interconnect, Polymer, Polishing

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