Study on electrochemical mechanical polishing process of copper circuit on PCB
Nadiia Kulyk, Chang Yong An, Jung Hoon Oh, Sung‐Min Cho, Changsup Ryu, Young Kwan Ko, Chan‐Hwa Chung
Abstract
Nadiia Kulyk, Chang Yong An, Jung Hoon Oh, Sung‐Min Cho, Changsup Ryu, Young Kwan Ko, Chan‐Hwa Chung
Abstract
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Key concepts: Chemical-mechanical planarization, Polishing, Materials science, Copper, Process (computing), Electrochemistry, Composite material, Metallurgy