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1996•Journal of Analytical and Applied PyrolysisRequires access

IR laser-induced chemical vapour deposition of silicon oxycarbide phases from 1,1,3,3-tetramethyldisiloxane

Josef Pola, Dana Pokorná, Zdenĕk Bastl, Ján Šubrt

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Key concepts: Dimethylsilane, Trimethylsilane, Decomposition, Silicon, Materials science, Pyrolysis, Chemical vapor deposition, Laser

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IR laser-induced chemical vapour deposition of silicon oxycarbide phases from 1,1,3,3-tetramethyldisiloxane — Research Paper | ScholarLens