2010•Advanced structured materialsRequires access

Fullerene (C60) and its Derivatives as Resists for Electron Beam Lithography

Hasnah Mohd Zaid

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Key concepts: Resist, Electron-beam lithography, Lithography, Materials science, Photolithography, Next-generation lithography, Nanotechnology, Cathode ray

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Fullerene (C60) and its Derivatives as Resists for Electron Beam Lithography — Research Paper | ScholarLens