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2020•International Forum “Microelectronics – 2020”. Joung Scientists Scholarship “Microelectronics – 2020”. XIII International conference «Silicon – 2020». XII young scientists scholarship for silicon nanostructures and devices physics, material science, process and analysisOpen access

ATOMIC LAYER DEPOSITION OF THIN FILMS OF METAL AND THEIR OXIDES

Sergey Zyuzin, E. S. Gornev, Askar Rezvanov, Vitaliy V. Panin

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Abstract

In this paper existing methods of atomic layer deposition of thin films of cobalt, ruthenium and their oxides are considered for their application for various purposes in the field of microelectronics.

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What this paper is about

In this paper existing methods of atomic layer deposition of thin films of cobalt, ruthenium and their oxides are considered for their application for various purposes in the field of microelectronics.

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Available abstract

In this paper existing methods of atomic layer deposition of thin films of cobalt, ruthenium and their oxides are considered for their application for various purposes in the field of microelectronics.

Key concepts: Microelectronics, Atomic layer deposition, Thin film, Materials science, Layer (electronics), Deposition (geology), Cobalt, Ruthenium

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