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Effects of Deposition Parameters on Thin Film Properties of Silicon-Based Electronic Materials Deposited by Remote Plasma-Enhanced Chemical-Vapor Deposition

Jeremy A. Theil

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Key concepts: Deposition (geology), Materials science, Thin film, Silicon, Chemical vapor deposition, Combustion chemical vapor deposition, Plasma-enhanced chemical vapor deposition, Plasma

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Effects of Deposition Parameters on Thin Film Properties of Silicon-Based Electronic Materials Deposited by Remote Plasma-Enhanced Chemical-Vapor Deposition — Research Paper | ScholarLens