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1991•Denki Kagaku oyobi Kogyo Butsuri KagakuOpen access

Positive and Negative Chemically Amplified Resists for Excimer Laser Lithography

Nobuaki Hayashi, Takumi Ueno, Hiroshi Shiraishi, Leo Schlegel, Takao Iwayanagi

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Abstract

ReceivedJuly29，19911Accepted September12，

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ReceivedJuly29，19911Accepted September12，

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Available abstract

ReceivedJuly29，19911Accepted September12，

Key concepts: Resist, Lithography, Excimer laser, Materials science, Excimer, Optics, Optoelectronics, Laser

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