ScholarLens Back to search
2002•Encyclopedia of Polymer Science and TechnologyRequires access

Lithographic Resists

William D. Hinsberg, Gregory M. Wallraff, Robert D. Allen

Open publisher page 0 citations

Abstract

Abstract An introduction to lithographic resists is presented. The principles of lithography are described and the essential attributes resist materials must possess are enumerated. The chemical and physical properties of resists of current technological importance are discussed within this framework, with an emphasis on how functional performance is related to these properties. Finally, examples are provided of how resist materials are being tailored for future lithographic imaging technologies.

About this research paper

What this paper is about

Abstract An introduction to lithographic resists is presented. The principles of lithography are described and the essential attributes resist materials must possess are enumerated. The chemical and physical properties of resists of current technological importance are discussed within this framework, with an emphasis on how functional performance is related to these properties. Finally, examples are provided of how resist materials are being tailored for future lithographic imaging technologies.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Abstract An introduction to lithographic resists is presented. The principles of lithography are described and the essential attributes resist materials must possess are enumerated. The chemical and physical properties of resists of current technological importance are discussed within this framework, with an emphasis on how functional performance is related to these properties. Finally, examples are provided of how resist materials are being tailored for future lithographic imaging technologies.

Key concepts: Resist, Lithography, Nanotechnology, Materials science, Optoelectronics, Layer (electronics)

Related papers

Related paper 1Related paper 2
Back to paper searchBrowse research topicsOriginal source
Lithographic Resists — Research Paper | ScholarLens