ScholarLens Back to search
2007•Sensors and Actuators A PhysicalRequires access

Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches

Shimul C. Saha, Håkon Sagberg, E. Poppe, Geir Uri Jensen, Tor A. Fjeldly, Trond Sæther

Open publisher page 21 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

OpenAlex reports 21 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Resist, Photoresist, Materials science, Microelectromechanical systems, Dissolution, Nanotechnology, Lithography, Ashing

Related papers

Related paper 1Related paper 2Related paper 3
Back to paper searchBrowse research topicsOriginal source
Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches — Research Paper | ScholarLens