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1998•Microelectronic EngineeringRequires access

Dependence of the quality of thick resist structures on resist baking

G. Bleidießel, G. Gruetzner, F. Reuther, S. Fehlberg, Bernd Loechel, A. Macioßek

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Key concepts: Resist, Photoresist, Materials science, Optoelectronics, Nanotechnology, Layer (electronics)

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