2017•The Japan Society of Applied PhysicsRequires access

Single Step ICP (Inductively Coupled Plasmas) Dry-Etching Condition for Lateral pin Waveguide

Yuto Morita, Haisong Jiang, Kiich Hamamoto

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Key concepts: Materials science, Inductively coupled plasma, Dry etching, Etching (microfabrication), Plasma, Plasma etching, Optoelectronics, Reactive-ion etching

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