2014•The Japan Society of Applied PhysicsRequires access

Analysis of Surface Roughness during Si Etching in Inductively Coupled Cl 2 Plasmas: Effects of Pulse Bias Etching

Nobuya Nakazaki

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Key concepts: Materials science, Etching (microfabrication), Inductively coupled plasma, Surface roughness, Plasma, Surface finish, Plasma etching, Analytical Chemistry (journal)

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Analysis of Surface Roughness during Si Etching in Inductively Coupled Cl 2 Plasmas: Effects of Pulse Bias Etching — Research Paper | ScholarLens