Deposition and analysis of thin films produced in atmospheric pressure glow discharge

The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas with a small admixture of organosilicon compound – hexamethyldisiloxane (HMDSO) which was used as a monomer. The temperature of the substrate was elevated up to 120 °C to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between glow and filamentary regime. The surface atomic composition was measured by means of X -ray Photoelectron Spectroscopy (XPS). Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were transparent in visible range.