2001•Unpublished venueRequires access

Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures

Gabriel Crăciun, M. A. Blauw, E. van der Drift, P.J. French

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Key concepts: Faceting, Aspect ratio (aeronautics), Materials science, Etching (microfabrication), Homogeneity (statistics), Anisotropy, Silicon, Dry etching

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