Influence of Evaporation Rate on the Properties of Cd S Thin Films by Electron Beam Evaporation
Chen Zh
Abstract
Chen Zh
Abstract
Cd S thin films were prepared by electron beam evaporation(EBE) method with using high pure blocky Cd S on glass substrate. The crystal structure and surface morphology of the films were characterized by X-ray diffraction and atomic force microscopy;the optical and electrical properties of the films were analyzed by four probe resistance tester and ultraviolet visible spectrophotometer. The results showed that the evaporation rate had significant effects on the films structure and properties. The Cd S films prepared at 10?S-1were uniform and dense surface morphology and were presented the strongest peak intensities of the XRD patterns. The photoelectric properties were best. Moreover,the photo sensitiveness reached 7.7×102,the minimum light resistance was 1350Ω/□.
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Cd S thin films were prepared by electron beam evaporation(EBE) method with using high pure blocky Cd S on glass substrate. The crystal structure and surface morphology of the films were characterized by X-ray diffraction and atomic force microscopy;the optical and electrical properties of the films were analyzed by four probe resistance tester and ultraviolet visible spectrophotometer. The results showed that the evaporation rate had significant effects on the films structure and properties. The Cd S films prepared at 10?S-1were uniform and dense surface morphology and were presented the strongest peak intensities of the XRD patterns. The photoelectric properties were best. Moreover,the photo sensitiveness reached 7.7×102,the minimum light resistance was 1350Ω/□.
Key concepts: Evaporation, Electron beam physical vapor deposition, Photoelectric effect, Materials science, Substrate (aquarium), Thin film, Diffraction, Scanning electron microscope