Optimization of preparing technology for acidic texturing of multicrystalline silicon solar cells

Texturing of multicrystalline silicon was prepared by isotropic acidic etching in this paper.The reflectance and etching rate of texturing of multicrystalline silicon solar cell with orthogonal experiment were studied to investigate the effects of content of HNO3,HF and NaH2PO4·2 H2O under different formula of etching solution.The results reveal that NaH2PO4·2 H2O solution has a remarkable effect on the etching rate,then HF solution is the most important factors for reflectance,the second are HF and HNO3 solutions.The primary-secondary order of affect factors are HF,HNO3 and NaH2PO4·2 H2O solution for reflectance.In this experiment,the optimal proportion of acidic etching mixture solution was HF∶HNO3∶NaH2PO4·2 H2O = 9∶1∶7.Under the process condition,texturing of multicrystalline silicon was fabricated with more uniform etch pit with reflectance of around 17%.