Total dose effects in MOS devices under different dose rates
Zhu Xiaofeng, Zhou Kaiming, Xu Xi
Abstract
Zhu Xiaofeng, Zhou Kaiming, Xu Xi
Abstract
Three MOS devices are tested under two different dose rates of different simulation radiant point. The sensitive parameters related to the total-dose and the dose rate about the threshold voltage of MOSFET are studied in detail. The experiment results are analysed and discussed. Experimentation indicates:under the same radiation dose, ionizing radiation damage at low dose rate is more than that at high dose rate.
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Three MOS devices are tested under two different dose rates of different simulation radiant point. The sensitive parameters related to the total-dose and the dose rate about the threshold voltage of MOSFET are studied in detail. The experiment results are analysed and discussed. Experimentation indicates:under the same radiation dose, ionizing radiation damage at low dose rate is more than that at high dose rate.
Key concepts: Dose rate, Ionizing radiation, Radiation, Threshold voltage, Materials science, Radiation dose, Absorbed dose, Effective dose (radiation)