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Total dose effects in MOS devices under different dose rates

Zhu Xiaofeng, Zhou Kaiming, Xu Xi

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Abstract

Three MOS devices are tested under two different dose rates of different simulation radiant point. The sensitive parameters related to the total-dose and the dose rate about the threshold voltage of MOSFET are studied in detail. The experiment results are analysed and discussed. Experimentation indicates:under the same radiation dose, ionizing radiation damage at low dose rate is more than that at high dose rate.

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What this paper is about

Three MOS devices are tested under two different dose rates of different simulation radiant point. The sensitive parameters related to the total-dose and the dose rate about the threshold voltage of MOSFET are studied in detail. The experiment results are analysed and discussed. Experimentation indicates:under the same radiation dose, ionizing radiation damage at low dose rate is more than that at high dose rate.

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Available abstract

Three MOS devices are tested under two different dose rates of different simulation radiant point. The sensitive parameters related to the total-dose and the dose rate about the threshold voltage of MOSFET are studied in detail. The experiment results are analysed and discussed. Experimentation indicates:under the same radiation dose, ionizing radiation damage at low dose rate is more than that at high dose rate.

Key concepts: Dose rate, Ionizing radiation, Radiation, Threshold voltage, Materials science, Radiation dose, Absorbed dose, Effective dose (radiation)

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