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1988•The Review of Laser EngineeringOpen access

Excimer laser lithography.

Kazufumi Ogawa, Masaru Sasago, Masayuki Endo, Hideo Nakagawa, Yoshiyuki Tani, Takeshi Ishihara

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Abstract

An excimer laser stepper operating at 248.4nm was developed for use in0.5μm pattern fabrication.The stepper consists of a monochromatic fused silica lens and a new compact KrF excimer laser, whose oscillation spectrum has been line-narrowed (FWHM, 0.007nm). The5x projection lens has a field size of15×15mm2and the numerical aperture (NA) of 0.36. The use of this apparatus permits a pattern exposure of 0.5μm features without speckle; the resolution of 0.4μm line and space patterns was obtained by using a commercially available deep UV resist. A high throughput, equivalent to that of a conventional stepper, is also obtained.

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An excimer laser stepper operating at 248.4nm was developed for use in0.5μm pattern fabrication.The stepper consists of a monochromatic fused silica lens and a new compact KrF excimer laser, whose oscillation spectrum has been line-narrowed (FWHM, 0.007nm). The5x projection lens has a field size of15×15mm2and the numerical aperture (NA) of 0.36. The use of this apparatus permits a pattern exposure of 0.5μm features without speckle; the resolution of 0.4μm line and space patterns was obtained by using a commercially available deep UV resist. A high throughput, equivalent to that of a conventional stepper, is also obtained.

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Available abstract

An excimer laser stepper operating at 248.4nm was developed for use in0.5μm pattern fabrication.The stepper consists of a monochromatic fused silica lens and a new compact KrF excimer laser, whose oscillation spectrum has been line-narrowed (FWHM, 0.007nm). The5x projection lens has a field size of15×15mm2and the numerical aperture (NA) of 0.36. The use of this apparatus permits a pattern exposure of 0.5μm features without speckle; the resolution of 0.4μm line and space patterns was obtained by using a commercially available deep UV resist. A high throughput, equivalent to that of a conventional stepper, is also obtained.

Key concepts: Stepper, Optics, Excimer laser, Numerical aperture, Materials science, Monochromatic color, Lithography, Photolithography

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