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Half-Micron krf excimer laser stepper lithography with new resist and water-soluble contrast enhanced materials

Masayuki Endo, Masaru Sasago, Yoshihiko Hirai, Kazufumi Ogawa, Takeshi Ishihara

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Abstract

Half-micron patterns have been fabricated using a newly developed high-speed KrF excimer laser stepper system with new resist, NOEL (Novolak based resist for Excimer Laser), and water-soluble contrast enhanced material, WSP-EX.

About this research paper

What this paper is about

Half-micron patterns have been fabricated using a newly developed high-speed KrF excimer laser stepper system with new resist, NOEL (Novolak based resist for Excimer Laser), and water-soluble contrast enhanced material, WSP-EX.

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Available abstract

Half-micron patterns have been fabricated using a newly developed high-speed KrF excimer laser stepper system with new resist, NOEL (Novolak based resist for Excimer Laser), and water-soluble contrast enhanced material, WSP-EX.

Key concepts: Stepper, Resist, Excimer laser, Lithography, Excimer, Materials science, Laser, Photolithography

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