1987•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access

Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials

Masayuki Endo, Masaru Sasago, Yoshihiko Hirai, Kazufumi Ogawa, Takeshi Ishihara

Abstract

Half-micron patterns have been fabricated using a newly developed high-speed KrF excimer laser stepper system with new resist, NOEL (Novolak based resist for Excimer Laser), and water-soluble contrast enhanced material, WSP-EX.

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Key concepts: Stepper, Resist, Excimer laser, Lithography, Materials science, Excimer, Photolithography, Laser