2000•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIERequires access
Large-area MEMS fabrication with thick SU-8 photoresist applied to an x-ray image sensor array
Jürgen Daniel, B. S. Krusor, Raj B. Apte, R. A. Street, A. Goredema, Jason McCallum, D.C. Boils-Boissier, Peter M. Kazmaier
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Abstract
MEMS fabrication on large area substrates is promising for novel system concepts, but processes based on crystalline silicon cannot be used. Polymeric materials such as the thick photoresist SU-8 are more appropriate for this purpose because their processing can be scaled to large areas. An x- ray image sensor array based on amorphous silicon on glass substrates was taken as an examples to apply the SU-8 microfabrication technique. We anticipate an improved performance of the imager. The resolution of the x-ray imager is expected to increase by patterning the x-ray conversion screen into cells, which match the sensor pixels of the imager, and SU-8 defines these cells. Furthermore, SU-8 functions as a thick interlayer dielectric with decrease the electronic noise and result in a higher sensitivity of the imager. The fabrication process with SU-8 will be described and challenging issues, especially when considering large area substrates, will be discussed.