SiGe HBT BiCMOS technology for millimeter‐wave applications
Alvin Joseph, M. Dahlstrǒm, Qizhi Liu, B. A. Orner, Xuefeng Liu, David C. Sheridan, Robert M. Rassel, J. Dunn, D. Ahlgren
Abstract
Alvin Joseph, M. Dahlstrǒm, Qizhi Liu, B. A. Orner, Xuefeng Liu, David C. Sheridan, Robert M. Rassel, J. Dunn, D. Ahlgren
Abstract
We present the advances in Silicon Germanium Heterojunction Bipolar Transistor (SiGe HBT) and BiCMOS technology capabilities to address the emerging millimetre-wave (mmWave) applications. SiGe HBTs with f MAX performance reaching 350 GHz that are integrated with advanced CMOS and high-frequency passives is envisioned to allow better integration capability for mmWave applications. This capability of SiGe HBT BiCMOS technology is discussed relative to an InP HBT technology. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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We present the advances in Silicon Germanium Heterojunction Bipolar Transistor (SiGe HBT) and BiCMOS technology capabilities to address the emerging millimetre-wave (mmWave) applications. SiGe HBTs with f MAX performance reaching 350 GHz that are integrated with advanced CMOS and high-frequency passives is envisioned to allow better integration capability for mmWave applications. This capability of SiGe HBT BiCMOS technology is discussed relative to an InP HBT technology. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
Key concepts: Heterojunction bipolar transistor, BiCMOS, Silicon-germanium, Extremely high frequency, CMOS, Bipolar junction transistor, Heterojunction, Electrical engineering