Retention Performance of Ferroelectric Polymer Film for Nonvolatile Memory Devices
Woo Young Kim, Du Ka, Byeongok Cho, Sang Youl Kim, Yong Soo Lee, Hee Chul Lee
Abstract
Woo Young Kim, Du Ka, Byeongok Cho, Sang Youl Kim, Yong Soo Lee, Hee Chul Lee
Abstract
For nonvolatile memory devices, capacitors with metal-ferroelectric-metal structures were fabricated using poly(vinylidene fluoride-trifluoroethylene) as a ferroelectric layer, and performance was estimated in terms of retention property. In the same thickness, the polarization retained longer as the writing pulsewidth (PW) was extended. With the same writing PW, a thicker capacitor maintained a polarized state longer. In conclusion, the performance for operating voltage, operating frequency, and data retention time is expected.
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For nonvolatile memory devices, capacitors with metal-ferroelectric-metal structures were fabricated using poly(vinylidene fluoride-trifluoroethylene) as a ferroelectric layer, and performance was estimated in terms of retention property. In the same thickness, the polarization retained longer as the writing pulsewidth (PW) was extended. With the same writing PW, a thicker capacitor maintained a polarized state longer. In conclusion, the performance for operating voltage, operating frequency, and data retention time is expected.
Key concepts: Ferroelectricity, Non-volatile memory, Capacitor, Materials science, Ferroelectric capacitor, Optoelectronics, Polarization (electrochemistry), Data retention