High-performance E-mode AlGaN/GaN HEMTs
Tomás Palacios, Chang Soo Suh, A. Chakraborty, S. Keller, Steven P. DenBaars, Umesh Kumar Mishra
Abstract
Tomás Palacios, Chang Soo Suh, A. Chakraborty, S. Keller, Steven P. DenBaars, Umesh Kumar Mishra
Abstract
Enhancement-mode AlGaN/GaN high electron-mobility transistors have been fabricated with a gate length of 160 nm. The use of gate recess combined with a fluorine-based surface treatment under the gate produced devices with a threshold voltage of +0.1 V. The combination of very high transconductance (> 400 mS/mm) and low gate leakage allows unprecedented output current levels in excess of 1.2 A/mm. The small signal performance of these enhancement-mode devices shows a record current cutoff frequency (f/sub T/) of 85 GHz and a power gain cutoff frequency (f/sub max/) of 150 GHz.
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Enhancement-mode AlGaN/GaN high electron-mobility transistors have been fabricated with a gate length of 160 nm. The use of gate recess combined with a fluorine-based surface treatment under the gate produced devices with a threshold voltage of +0.1 V. The combination of very high transconductance (> 400 mS/mm) and low gate leakage allows unprecedented output current levels in excess of 1.2 A/mm. The small signal performance of these enhancement-mode devices shows a record current cutoff frequency (f/sub T/) of 85 GHz and a power gain cutoff frequency (f/sub max/) of 150 GHz.
Key concepts: Transconductance, Cutoff frequency, Materials science, Optoelectronics, Transistor, Threshold voltage, Wide-bandgap semiconductor, High-electron-mobility transistor