AlGaN/GaN double-channel HEMT
Quan Si, Hao Yue, Xiaohua Ma, Zheng Peng-Tian, Xie Yuanbin
Abstract
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Quan Si, Hao Yue, Xiaohua Ma, Zheng Peng-Tian, Xie Yuanbin
Abstract
Open-access reader
The fabrication of AlGaN/GaN double-channel high electron mobility transistors on sapphire substrates is reported. Two carrier channels are formed in an AlGaN/GaN/AlGaN/GaN multilayer structure. The DC performance of the resulting double-channel HEMT shows a wider high transconductance region compared with single-channel HEMT. Simulations provide an explanation for the influence of the double-channel on the high transconductance region. The buffer trap is suggested to be related to the wide region of high transconductance. The RF characteristics are also studied.
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The fabrication of AlGaN/GaN double-channel high electron mobility transistors on sapphire substrates is reported. Two carrier channels are formed in an AlGaN/GaN/AlGaN/GaN multilayer structure. The DC performance of the resulting double-channel HEMT shows a wider high transconductance region compared with single-channel HEMT. Simulations provide an explanation for the influence of the double-channel on the high transconductance region. The buffer trap is suggested to be related to the wide region of high transconductance. The RF characteristics are also studied.
Key concepts: Transconductance, High-electron-mobility transistor, Materials science, Optoelectronics, Sapphire, Channel (broadcasting), Transistor, Fabrication