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Optimization of Electron Cyclotron Resonance Reactive Ion Beam Etching Reactors for Dry Etching of GaAs with Cl2

K. Nishioka, Masakazu Sugiyama, Masahiro Nezuka, Yukihiro Shimogaki, Yoshiaki Nakano, Kazuya Tada, Hiroshi Komiyama

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Abstract

Optimization of Electron Cyclotron Resonance Reactive Ion Beam Etching Reactors for Dry Etching of GaAs with Cl2 , Nishioka, K., Sugiyama, M., Nezuka, M., Shimogaki, Y, Nakano, Y., Tada, K., Komiyama, H.

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Optimization of Electron Cyclotron Resonance Reactive Ion Beam Etching Reactors for Dry Etching of GaAs with Cl2 , Nishioka, K., Sugiyama, M., Nezuka, M., Shimogaki, Y, Nakano, Y., Tada, K., Komiyama, H.

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Available abstract

Optimization of Electron Cyclotron Resonance Reactive Ion Beam Etching Reactors for Dry Etching of GaAs with Cl2 , Nishioka, K., Sugiyama, M., Nezuka, M., Shimogaki, Y, Nakano, Y., Tada, K., Komiyama, H.

Key concepts: Electron cyclotron resonance, Dry etching, Reactive-ion etching, Etching (microfabrication), Homogeneity (statistics), Isotropic etching, Plasma, Plasma etching

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