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1991•Journal of Photopolymer Science and TechnologyOpen access

Acid catalyzed resist for KrF excimer laser lithography.

Yasunobu Onishi, Hirokazu Niki, Y. Kobayashi, Rumiko Hayase, Naohiko Oyasato, Osamu Sasaki

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Key concepts: Resist, Materials science, Excimer laser, Lithography, Excimer, Catalysis, Laser, Optoelectronics

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Acid catalyzed resist for KrF excimer laser lithography. — Research Paper | ScholarLens