1996•Journal of Photopolymer Science and TechnologyOpen access

THE STATE-OF-THE-ART OF ArF EXCIMER LASER LITHOGRAPHY

Tohru Ogawa

Abstract

The current status of Argon fluoride (ArF) excimer laser lithography is reviewed. The concurrent development with the worldwide cooperation involving all of the manufacturer, such as glass, laser, stepper, photoresist, mask, and chip, will be indispensable to shorten the development term of ArF excimer laser lithography. Especially, it is essential to obtain a consensus of the specification for each elemental technology in all of the manufacturer to execute the efficient development.

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Key concepts: Excimer laser, Materials science, Photoresist, Lithography, Stepper, Photolithography, Excimer, Laser