Characterization of ZrN Thin Films Deposited by Reactive DC Magnetron Sputtering
Attapol Choeysuppaket, Nirun Witit-Anun, Surasing Chaiyakun
Abstract
Attapol Choeysuppaket, Nirun Witit-Anun, Surasing Chaiyakun
Abstract
In the past decade, many transition metal nitride thin films, especially titanium nitride (TiN) and zirconium nitride (ZrN), have been widely used as hard coatings, decorative coatings, diffusion barriers in IC technology and heat mirrors, as a result of their attractive properties of high hardness, corrosion resistance, thermal stability and electrical resistivity [1-4]. However, the ZrN films have shown significant performance regarding to its higher hardness, better corrosion resistance, lower electrical resistivity and warmer golden colour compared to those of the TiN films. ZrN films have shown significant performance advantages over TiN films [5-.
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In the past decade, many transition metal nitride thin films, especially titanium nitride (TiN) and zirconium nitride (ZrN), have been widely used as hard coatings, decorative coatings, diffusion barriers in IC technology and heat mirrors, as a result of their attractive properties of high hardness, corrosion resistance, thermal stability and electrical resistivity [1-4]. However, the ZrN films have shown significant performance regarding to its higher hardness, better corrosion resistance, lower electrical resistivity and warmer golden colour compared to those of the TiN films. ZrN films have shown significant performance advantages over TiN films [5-.
Key concepts: Zirconium nitride, Materials science, Tin, Titanium nitride, Metallurgy, Electrical resistivity and conductivity, Nitride, Sputtering