2013•Solid-State ElectronicsRequires access

Improvement of metal gate/high-k dielectric CMOSFETs characteristics by atomic layer etching of high-k gate dielectric

K. S. Min, C. Park, Chang Yong Kang, C.S. Park, B.J. Park, Y.W. Kim, Byoung Hun Lee, Jack C. Lee, G. Bersuker, P. D. Kirsch, R. Jammy, Geun Young Yeom

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Key concepts: High-κ dielectric, Metal gate, Gate dielectric, Materials science, Dielectric, Etching (microfabrication), Layer (electronics), Optoelectronics

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Improvement of metal gate/high-k dielectric CMOSFETs characteristics by atomic layer etching of high-k gate dielectric — Research Paper | ScholarLens