2000•Materials Science and Engineering BRequires access

A comparative Raman spectroscopy study on silicon surface in HF, HF/H2O2 and HF/NH4F aqueous solutions

Jing Wang, Hailing Tu, Wuxin Zhu, Qigang Zhou, Ansheng Liu, Chun Zhang

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Key concepts: Hydrofluoric acid, Silicon, Raman spectroscopy, Aqueous solution, Etching (microfabrication), Materials science, Hydrogen, Inorganic chemistry