2010•Journal of Colloid and Interface ScienceRequires access

Novel phosphate-functionalized silica-based dispersions for selectively polishing silicon nitride over silicon dioxide and polysilicon films

P.R. Veera Dandu, Naresh K. Penta, Brown Peethala, Suryadevara V. Babu

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Key concepts: Silicon dioxide, Silicon nitride, Silicon, Materials science, LOCOS, Chemical engineering, Nitride, Polishing

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