Unstrained epitaxial InxGa1−x As films obtained on porous GaAs
F. Yu. Soldatenkov, V. P. Ulin, A. A. Yakovenko, О. М. Федорова, S. G. Konnikov, В. И. Корольков
Abstract
F. Yu. Soldatenkov, V. P. Ulin, A. A. Yakovenko, О. М. Федорова, S. G. Konnikov, В. И. Корольков
Abstract
Epitaxial layers of InGaAs solid solutions were grown on porous GaAs(100) substrates by liquid-phase epitaxy. A comparison between the compositions and thicknesses of these epitaxial layers with those of layers obtained under the same conditions on normal monolithic GaAs substrates suggests that the crystallization of epitaxial layers on porous substrates may be considered as the growth of free unstrained films.
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Epitaxial layers of InGaAs solid solutions were grown on porous GaAs(100) substrates by liquid-phase epitaxy. A comparison between the compositions and thicknesses of these epitaxial layers with those of layers obtained under the same conditions on normal monolithic GaAs substrates suggests that the crystallization of epitaxial layers on porous substrates may be considered as the growth of free unstrained films.
Key concepts: Epitaxy, Materials science, Optoelectronics, Porosity, Crystallization, Liquid phase, Layer (electronics), Chemical engineering