Cong Wang, Bing Wang, Kenneth Eng Kian Lee, Soon Fatt Yoon, Jürgen Michel
Abstract
A yellow InGaP light emitting diode (LED) emitting at 590 nm epitaxially grown on Si substrate with SiGe and GaAsP buffer layers is demonstrated. Characterizations of the epitaxy growth and device fabrication are presented.
OpenAlex reports 2 citations for this work. Citation counts describe recorded attention and do not establish research quality.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
A yellow InGaP light emitting diode (LED) emitting at 590 nm epitaxially grown on Si substrate with SiGe and GaAsP buffer layers is demonstrated. Characterizations of the epitaxy growth and device fabrication are presented.
Key concepts: Epitaxy, Optoelectronics, Materials science, Substrate (aquarium), Fabrication, Light-emitting diode, Diode, Nanotechnology