2008•MRS ProceedingsRequires access

MW plasma enhanced CVD of intrinsic Si for thin film solar cells

Bas B. Van Aken, H. Leegwater, Maarten Dörenkämper, Camile Devilee, Jochen Löffler, Maurits C. R. Heijna, W.J. Soppe

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Key concepts: Materials science, Plasma-enhanced chemical vapor deposition, Microcrystalline silicon, Amorphous silicon, Deposition (geology), Raman spectroscopy, Chemical vapor deposition, Thin film

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MW plasma enhanced CVD of intrinsic Si for thin film solar cells — Research Paper | ScholarLens