1997•MRS ProceedingsRequires access

Novel Plasma Control Method in PECVD for Preparing Microcrystalline Silicon

Tatsuyuki Nishimiya, Michio Kondo, Akihisa Matsuda

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Key concepts: Microcrystalline silicon, Plasma-enhanced chemical vapor deposition, Materials science, Microcrystalline, Plasma, Silicon, Growth rate, Chemical vapor deposition