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Growth of tio(x) films magnetron sputtering by high power pulsed from a compound tio(1.8) target

Kostas Sarakinos, Jones Alami, Christian Klever, Matthias Wuttig

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Abstract

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO(x) (x greater than 1.8) films from a ceramic TiO(1.8) target in an Ar-O(2) ambient. The film properties have b ...

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What this paper is about

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO(x) (x greater than 1.8) films from a ceramic TiO(1.8) target in an Ar-O(2) ambient. The film properties have b ...

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OpenAlex reports 10 citations for this work. Citation counts describe recorded attention and do not establish research quality.

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Available abstract

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO(x) (x greater than 1.8) films from a ceramic TiO(1.8) target in an Ar-O(2) ambient. The film properties have b ...

Key concepts: High-power impulse magnetron sputtering, Materials science, Sputter deposition, Ceramic, Sputtering, Cavity magnetron, Pulsed power, Pulsed DC

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