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2007•RWTH Publications (RWTH Aachen)Open access

Growth of TiOX Films by High Power Pulsed Magnetron Sputtering from a Compound TiO1.8 Target

Kostas Sarakinos, Jones Alami, Christian Klever, Matthias Wuttig

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Abstract

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO x (x > 1.8) films from a ceramic TiO 1.8 target in an Ar-O 2 ambient. The film properties have been compared to those deposited by dc magnetron sputtering (dcMS). Both HPPMS and dcMS films exhibit an amorphous structure and are transparent. Furthermore, films grown by HPPMS have improved properties, such as higher density, higher refractive index and smoother film sur- face, as compared to those deposited by dcMS.

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What this paper is about

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO x (x > 1.8) films from a ceramic TiO 1.8 target in an Ar-O 2 ambient. The film properties have been compared to those deposited by dc magnetron sputtering (dcMS). Both HPPMS and dcMS films exhibit an amorphous structure and are transparent. Furthermore, films grown by HPPMS have improved properties, such as higher density, higher refractive index and smoother film sur- face, as compared to those deposited by dcMS.

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Available abstract

High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO x (x > 1.8) films from a ceramic TiO 1.8 target in an Ar-O 2 ambient. The film properties have been compared to those deposited by dc magnetron sputtering (dcMS). Both HPPMS and dcMS films exhibit an amorphous structure and are transparent. Furthermore, films grown by HPPMS have improved properties, such as higher density, higher refractive index and smoother film sur- face, as compared to those deposited by dcMS.

Key concepts: High-power impulse magnetron sputtering, Materials science, Sputter deposition, Amorphous solid, Cavity magnetron, Sputtering, Pulsed DC, Ceramic

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