2011•Applied Mechanics and MaterialsRequires access
Fabrication of TiO2 Films on Glass Substrates by a Pulsed Dc Reactive Magnetron Sputtering
Qi Min Wang, Teng Fei Zhang, Se‐Hun Kwon, Kwang Ho Kim
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Abstract
Due to its ability of photocatalysis and photoinduced superhydrophilicity, TiO2was paid significant attentions in recent years. In this study, TiO2films were deposited at room temperature and 300 °C by pulsed dc reactive magnetron sputtering. The gas pressure was varied in the range of 0.3-1.1 Pa by filling Ar/N2gas mixture with the ratio of 1:1. The surface morphologies, phase structure and optical property of the TiO2films were investigated. TiO2films with good crystalline quality containing mainly of anatase phase were obtained by deposition using gas pressure of 0.7 Pa at room temperature and gas pressure of 1.5 Pa at 300 °C.