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2015•Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and AtomsRequires access

Silicon defects characterization for low temperature ion implantation and RTA process

Diego Martirani Paolillo, Giovanni Margutti, Marco De Biase, Mario Barozzi, D. Giubertoni, Claudio Spaggiari

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Key concepts: Ion implantation, Materials science, Dopant Activation, Silicon, Dopant, Optoelectronics, Annealing (glass), Amorphous solid

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