2015•Journal of Alloys and CompoundsRequires access

Band alignment of atomic layer deposited high-k Al2O3/multilayer MoS2 interface determined by X-ray photoelectron spectroscopy

Xinke Liu, Jiazhu He, Dan Tang, Qiang Liu, Jiao Wen, Wenjie Yu, Youming Lu, Deliang Zhu, Wen-Jun Liu, Peijiang Cao, Sun Woong Han, Jisheng Pan, Wen-Jun Liu, Kah‐Wee Ang, Zhubing He

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Key concepts: X-ray photoelectron spectroscopy, Layer (electronics), Materials science, Atomic layer deposition, Spectroscopy, Analytical Chemistry (journal), Crystallography, Chemistry

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Band alignment of atomic layer deposited high-k Al2O3/multilayer MoS2 interface determined by X-ray photoelectron spectroscopy — Research Paper | ScholarLens