2014•Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIEOpen access

Application of atomic layer deposition in nanophotonics

Lasse Karvonen, Antti Säynätjoki, M. Roussey, Markku Kuittinen, Seppo Honkanen

Abstract

We review our recent results on using Atomic Layer Deposition (ALD) in fabrication of nanophotonic waveguide devices. ALD is a unique thin film deposition method providing atomic level control of film composition and thickness, perfect step coverage, and large-area uniformity. We employ the advantages of ALD in connection with Sinanophotonics. We present several new structures based on filling silicon slot waveguides or coating the silicon strip waveguides with ALD-grown materials. Also ALD grown TiO2 strip waveguides are introduced.

About this research paper

What this paper is about

Why it matters

OpenAlex reports 2 citations for this work. Citation counts describe recorded attention and do not establish research quality.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Key concepts: Atomic layer deposition, Nanophotonics, Silicon, Fabrication, Materials science, Deposition (geology), Layer (electronics), Optoelectronics